High-temperature large Polyimide vacuum wand tip for special handling of heavy substrates to/from a platen, evaporator, hotplate or flat surface in a cleanroom environment. Features sharp edged profile with a large vacuum pocket designed for safely handling heavy SEMI 200mm silicon wafers. Press-fit type installation, includes tip, tubing and adapter - fully assembled. For handling of 200 mm wafer substrates. ISO Class 3.